Abstract

Electron-beam evaporation of multilayers for the soft x-ray region has had extensive support by the work of Spiller.¹ Many of these principles have been incorporated in a uniquely designed deposition chamber at the University of Rochester. The deposition rate and thickness control are measured in situ by a soft x-ray reflectivity monitor and a quartz crystal oscillator. Substrate positioning and photon detection are stepper motor controlled through one axis of rotation. This enables the reflectometer to be fine-tuned during deposition as well as provide postdeposition evaluation. A modified Henke tube with various targets serves as the characteristic line source for the reflectometer. Filters and a single-channel analyzer suppress unwanted signals. The system is designed to monitor optically multilayer periods in excess of 20 Å.

© 1987 Optical Society of America