Residual Stress and Optical Properties of TiO2 Thin Film during Annealing by Different Deposition Methods

Hsi-Chao Chen; Kuan-Shiang Lee; Kuan-Shiang Lee; Cheng-Chung Lee; Cheng-Chung Lee

doi:10.1364/OIC.2007.TuA4

Optical Interference Coatings
OSA Technical Digest (CD) (Optica Publishing Group, 2007),
paper TuA4
•https://doi.org/10.1364/OIC.2007.TuA4

Residual Stress and Optical Properties of TiO₂ Thin Film during Annealing by Different Deposition Methods

Hsi-Chao Chen, Kuan-Shiang Lee, and Cheng-Chung Lee

Optical Interference Coatings 2007

Tucson, Arizona United States
3–8 June 2007
ISBN: 1-55752-841-1

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Coating Microstructure (TuA)

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H. Chen, K. Lee, and C. Lee, "Residual Stress and Optical Properties of TiO2 Thin Film during Annealing by Different Deposition Methods," in Optical Interference Coatings, OSA Technical Digest (CD) (Optica Publishing Group, 2007), paper TuA4.

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Abstract

TiO₂ films were prepared by different deposition methods. At sputtering, stress was released after annealing. At evaporation, XRD showed the anatase crystal. TiO₂ films deposited by sputtering were more stable than by evaporation during annealing.

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