Soft X-ray reduction lithography using a reflection mask

H. Kinoshita; K. Kurihara; T. Mizota; T. Haga; Y. Torii; H. Takenaka; Y. Ishii

doi:10.1364/SWCR.1991.WD2

Short-Wavelength Coherent Radiation: Generation and Application
Technical Digest Series (Optica Publishing Group, 1991),
paper WD2
•https://doi.org/10.1364/SWCR.1991.WD2

Soft X-ray reduction lithography using a reflection mask

H. Kinoshita, K. Kurihara, T. Mizota, T. Haga, Y. Torii, H. Takenaka, and Y. Ishii

Short Wavelength Coherent Radiation: Generation and Applications 1991

Monterey, California United States
8–10 April 1991
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H. Kinoshita, K. Kurihara, T. Mizota, T. Haga, Y. Torii, H. Takenaka, and Y. Ishii, "Soft X-ray reduction lithography using a reflection mask," in Short-Wavelength Coherent Radiation: Generation and Application, Technical Digest Series (Optica Publishing Group, 1991), paper WD2.

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Abstract

We have conducted the research work on X-ray projection lithography and have already demonstrated a 0.5 μm replicated pattern using a reflection mask. To obtain smaller features, we have designed a Schwarzschild typed demagnifying objective with a numerical aperture size of 0.1 and fabricated a Mo/B₄C multilayer very precisely on its optics.

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