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Conferences > EUL > 1996 > R > R39

Characterization of SAL605 Negative Resist at λ=13 nm

Bruno La Fontaine, D. Ciarlo, D. P. Gaines, and D. R. Kania

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Abstract

We have characterized the response of the negative resist SAL605 in the extreme ultraviolet (λ=13nm). The sensitivity was found to be ~1 mJ/cm2 for all conditions studied. We have identified processing conditions leading to high (γ>4) contrast. The resist response was modeled using Prolith/2 and the development parameters were obtained from the exposure curves.

© 1996 Optical Society of America

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